Chemical Vapor Deposition - Advanced Coatings & Surface Technology

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Chemical vapor deposition (CVD) is a chemical process in which the substrate is exposed to volatile precursors that react and decompose on the substrate to produce a thin high quality coating. There are several different variations of CVD such as plasma enhanced CVD, low pressure CVD, atmospheric pressure CVD, and high pressure CVD. Out of these, low pressure CVD is the technology segment that holds the maximum share (close to 37%). The technology is used in many different end-user industries such as microelectronics, cutting tools, industrial, energy, medical devices, and healthcare. The demand of this technology is maximum in the electronics segment.The Advanced Coating & Surface Technology TechVision Opportu

Table of Contents

Chemical Vapor Deposition - Advanced Coatings & Surface TechnologyAdvances in Chemical Vapor Deposition (CVD)Polytetrafluoroethylene (PTFE) Coating by Initiated Chemical Vapor Deposition (iCVD)Large Area Plasma Enhanced Chemical Vapor Deposition (LAPECVD)Dragon XP8Light Rotating X-ray Anodes/Targets Strategic InsightsCompetitive Landscape and Patent AnalysisAnalyst’s PerspectivesKey PatentsKey PatentsKey Patents (continued)Industry ContactsIndustry Contacts

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