Global Advances in Semiconductor Microlithography Technologies (Technical Insights)

Global Advances in Semiconductor Microlithography Technologies (Technical Insights)

RELEASE DATE
25-Jun-2007
REGION
Research Code: D0A4-01-00-00-00
SKU: ES00437-GL-TR_15765
AvailableYesPDF Download
$4,950.00
In stock
SKU
ES00437-GL-TR_15765
$4,950.00
DownloadLink
ENQUIRE NOW

Description

This research service deals with the advances in next generation microlithography technologies.

Table of Contents

Overview of Lithography Technology

  • Lithography and its Role in Semiconductor Fabrication
  • Highlights and Key Findings

Scope and Methodology

  • Scope of the Research Service
  • Research Methodology

Why is it Important?

Analysis of the NGL Candidates

  • The Need to Support Technological Evolution
  • Major Issues

Overview and Current Status of Optical Lithography

Immersion Lithography

Extreme Ultraviolet Lithography (EUVL)

  • Optical Lithography--Overview
  • Current Status of Development

157 nm Lithography

  • Immersion Lithography--Overview
  • Immersion Lithography--Technology Challenges

Key Technology Developments--I

  • EUVL--Overview
  • Technology Benefits
  • EUVL Research Groups
  • EUVL--Technology Challenges

Key Technology Developments--II

  • The End of 157 nm Lithography?
  • Technology Challenges

Introduction

Maskless Lithography

Electron Projection Lithography

Electron Proximity Projection Lithography

Key Technology Developments Related to this Sector

Introduction and Technology Description

Key Adoption Factors

Key Technology Developments Related to NIL Sector

Related Research
This research service deals with the advances in next generation microlithography technologies.
More Information
No Index Yes
Podcast No
Industries Electronics and Sensors
WIP Number D0A4-01-00-00-00
Is Prebook No