Global Advances in Semiconductor Microlithography Technologies (Technical Insights)

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This research service deals with the advances in next generation microlithography technologies.

Table of Contents

Global Advances in Semiconductor Microlithography Technologies (Technical Insights), Executive SummaryOverview of Lithography TechnologyLithography and its Role in Semiconductor FabricationHighlights and Key FindingsScope and MethodologyScope of the Research ServiceResearch MethodologyGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), The Search for Next Generation LithographyWhy is it Important?The Need to Support Technological EvolutionMajor IssuesAnalysis of the NGL CandidatesTrends in NGLNGL Technologies--A ForesightGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), Optical LithographyOverview and Current Status of Optical LithographyOptical Lithography--OverviewCurrent Status of DevelopmentImmersion LithographyImmersion Lithography--OverviewImmersion Lithography--Technology ChallengesExtreme Ultraviolet Lithography (EUVL)EUVL--OverviewTechnology BenefitsEUVL Research GroupsEUVL--Technology Challenges157 nm LithographyThe End of 157 nm Lithography?Technology ChallengesKey Technology Developments--IHigh-Power EUVL Source--Powerlase Limited--UKEffect of Resist Blurring on the Resolution of Arf Immersion Lithography--Canon Inc.--JapanThe Rise of Inverse Lithography Technology--Luminescent Technologies Inc.--USASpecial Routing Technique to Reduce Defect Density--TSMC--Taiwan3D Lithography Technology for Nanostructures--Focal Point Microsystems LLC--USAOPC Simulation to Minimize Cost of Mask Development--Mentor Graphics Corporation--USAIndustry Group to Introduce EUVL for 45 nm--EUVA--JapanFirst EUV Exposed Image--A Milestone in Microlithographic Research--University at Albany--USAAdvanced DFM Lithography Solution for 45 nm and below--Nikon Precision Inc. and Synopsys Inc.--USAExtending the Limits of Photolithography--IBM Almaden Research Center--USAKey Technology Developments--IIThe Merger of Computational and Wafer Lithography--Brion Technologies Inc.--USANanolithograhic Enhancement by Application of Nanoscale Ridge Apertures--Purdue University--USAThe Right Source for EUVL--Cymer Inc.--USALeading in Immersion and EUV Lithography--ASML--NetherlandsX-Ray-Based Micro-/Nanomanufacturing--Singapore Synchrotron Light Source--SingaporeInterface Lithography--National Institute for Matter Physics--ItalyGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), Electron Projection Lithography and Maskless LithographyIntroductionMaskless LithographyElectron Projection Lithography (EPL)Electron Proximity Projection LithographyMaskless LithographyElectron Beam LithographyO-ML2 and CP-ML2Ion Beam LithographyMix and Match StrategyElectron Projection LithographyCurrent Status of EPLTechnology Challenges and Potential SolutionsElectron Proximity Projection LithographyCurrent Status of LEEPLAdvantages and ChallengesKey Technology Developments Related to this SectorA New Approach using Interference Lithography with Deep Reactive Ion Etching—University of California--USAA New Way to Create Nanogaps--University of Pennsylvania--USAVariable-Pressure E-Beam Lithography--Northwestern University--USAGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), Nanoimprint LithographyIntroduction and Technology DescriptionIntroductionNIL Technologies and ApplicationsKey Adoption FactorsNIL Technology BenefitsMajor ChallengesTechnical Requirements and Current Status of NILKey Technology Developments Related to NIL SectorA New Holographic Contact Lithography Approach for Photonic Crystals--National University of Singapore--SingaporeImprint Lithography--A Viable Alternative for NGL--Molecular Imprints--USAMajor Issue in NIL Resolved--Nanonex Corp and Princeton University--USAHigh-Precision Aligner Systems for NIL--EV Group--AustriaAdvanced NIL Technique for Research and Industrial Applications--Obducat AB--SwedenGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), NGL--Technology Foresight; Funding AnalysisFuture Outlook--Analyst InsightsOverview of NGL TechnologiesFuture of Optical Lithography157 nm Immersion Lithography for 32 nm?Direct-Write Lithography and Electron Projection LithographyExtreme Ultraviolet LithographyNanoimprint LithographyMajor Fundings and GrantsDARPA and NIST Have Ceased Funding for US Maskless LithographyFour Texan Startups Receive AMRC FundingUS Commerce Department Holds New Funding Competition for High-Risk Industrial ResearchUniversity of Albany’s NanoCollege and Vistec Lithography Receive Funding from New York State OfficeVeeco Receives Further Funding from SEMATECH for EUVL Mask ToolsMajor Funding for El-Mul's Nanotube E-Beam Field EmitterMultimillion Pound Funding Boost for Research at James Watt Nanofabrication CentreMolecular Imprints Secures More FundingGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), Key Patents and Contact DetailsRecent PatentsList of Key Patents from Market LeadersAnalysis of Patents from Emerging Companies in this SectorContact DetailsCorporatesUniversities and Research InstitutesGlobal Advances in Semiconductor Microlithography Technologies (Technical Insights), Decision Support DatabaseDecision Support Database TablesGlobal OLED Market (2002 to 2012)Global LCD Sales (2002 to 2012)Consumer Electronics Contribution to Electronics Industry--2002 to 2012

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