Plasma-enhanced processing is gaining importance as a major tool for synthesis and manipulating of nanostructures. With the use of plasma, it is possible to achieve enhanced performance in end use products; for example, significant uniformity of thin layer can reduce the requirement for high temperature of a reaction, that can reduce its performance. The major restraint for plasma-enhanced nanoprocessing is high pricing and complex handling of precursors, raw materials that are used in these processes. Research and development are currently focused on nanoetching and thick layer deposition enhanced by plasma.
The Nanotech TechVision Opportunity Engine (TOE) provides intelligence on technologies, products, processes, applications, and strategic insights on nanotechnology-related innovations and their impact across various industries. Technology focus areas include nanomaterials, nanocoatings, nanohealthcare, nanomedicine, and nanomanufacturing.
Miniaturization, a move toward lower power consumption, and the need for enhanced features are driving innovations in the electronics sector. Technology focus areas include semiconductor manufacturing and design, flexible electronics, 3D integration/IC, MEMS and NEMS, solid state lighting, advanced displays, nanoelectronics, wearable electronics, brain computer interface, advanced displays, near field communication, and next generation data storage or memory.
Keywords: Nanotechnology, plasma, nanoprocessing, nanoetching, chemical vapor deposition (CVD), molding process, carbon nanotubes, silicon nanocrystals