Sputtering Deposition Techniques Help Increase Coating Efficiency

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Sputtering is a deposition process in which ionized gas molecule is used to displace atoms of a specific material (which is called the target) and is then deposited on to a substrate in a high energy environment. The target material forms a very strong bond at the atomic level to the substrate and can help create long lasting, durable substrates. This deposition technique is used across industries with high impact applications being semiconductor, electronics, medical, solar, and telecommunications. The Advanced Coating & Surface Technology TechVision Opportunity Engine (TOE) provides intelligence on technologies, products, processes, applications and strategic insights on various coatings across industries.

Table of Contents

Sputtering Deposition Techniques Help Increase Coating EfficiencyInnovations Based on Sputtering Deposition MethodsSputtering System that Can Process Both Planar and 3D ComponentsSputtering Mechanism Involving Two Anodes – Dual Anode Sputtering TechnologyMagnetron Sputtering System Powered by DC or RF for Thin Film DepositionSputtering System for Deposition of Coatings on Substrates at Low TemperaturesStrategic InsightsComparative Analysis of Innovations Highlight Need for Cost Effective Scalable Sputtering SystemsNeed for Sputtering Systems for Coating Large Surface Areas Key PatentsPatents Relation to Sputtering Technologies and its ApplicationsIndustry ContactsIndustry Contacts

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